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General Information About PVD Process


PVD processes are atomistic deposition process in which materials vaporized from a source is transported in the form of a vapor through a vacuum or low-pressure gaseous or plasma environment to the substrate, where it condenses. PVD processes can be used to deposit films of elements and molecules and also of compound

materials by the reaction of depositing material with the ambient gas environment. ( e.g., TiN ) or with a co-

depositing material (e.g. TiC ). Typically, PVD processes are used to deposit films with thickness in the range of a few nanometers to thousands of nanometers; however, they can be used to form graded-composition deposits of multi-layer coatings, very thick deposits, and freestanding structures.



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Foshan Foxin vacuum technology co.,ltd


NO.7-2, Liangui Zhong Road, Lianhe Industrial District, Luocun, Shishan Town, Nanhai District, Foshan,Guangdong,China


Foshan Foxin Vacuum Technology Co,. Ltd specializes in the R&D,production and sales of various vacuum applications. Committed to providing customized process technology and solutions according to customer needs. including unbalanced magnetro ,medium frequency magnetron sputtering ,multi arc-ion sputtering ,multi arc-ion and magnetron ion sputtering,arc evaporation sources equipment and other coating equipment. Widely used in tool cutting tools, military, automotive, lighting, mobile phones, hardware watches, jewelry, ceramics, stainless steel plates, stainless steel products and other industries.